Stress Induced Voiding & Electromigration Analysis of Cu-Cu bonds by Amandeep Singh Sappal, Manvinder Sharma, Harjinder Singh

Stress Induced Voiding & Electromigration Analysis of Cu-Cu bonds

Amandeep Singh Sappal, Manvinder Sharma, Harjinder Singh

60 pages missing pub info (editions)

nonfiction art technology
Powered by AI (Beta)
Loading...

Description

Face to Face Stacking on Wafer to Wafer (WoW) can be done for the Cu-Cu direct bonding interconnects. A good mechanical strength to sustain shear force during thinning can be achieved by Cu bonding. While making reliable interconnect structures ha...

Read more

Community Reviews

Loading...

Content Warnings

Loading...